Self-Organized NiO Microcavity Arrays Fabricated by Thermal Treatments

Abstract

The potential use of NiO in low-dimensional devices requires the upgrade of appropriate synthesis methods as well as the achievement of a deeper comprehension of the growth mechanisms and the properties of this p-type oxide at the micro- and nanoscale. In this work, arrays of NiO microcavities with potential use in catalysis, sensing, and high temperature templates have been achieved following a single step process based on the use a controlled argon flow during oxidation of metallic Ni. Fabrication of these self-organized cavities can widen the applicability of NiO in new fields of research avoiding large cost post-fabrication treatments and enhancing NiO properties of interest. Formation of these hole arrays at 1000–1200 °C with unique geometrical morphology and preferential (111) texturing has been discussed based on Ni oxidation mechanisms involving Ni lattice diffusion and strain release phenomena at the NiO surface. Moreover, NiO samples have been fabricated in the range of temperatures 800–1500 °C and characterized by a complete group of techniques in order to shed light on physical aspects related to NiO which still remain unambiguous, such as the bandgap or the understanding of the Raman signal. XRD measurements confirm the presence of strain related phenomena and lattice distortions during thermal treatments. Besides, cathodoluminescence analysis shows a wide signal from near-IR to UV commonly dominated by an emission at 2.5 eV related to Ni deficiency. An increase in the Ni3+/Ni2+ ratio together with a higher p-type character, as demonstrated by surface-sensitive X-ray photoelectron spectroscopy, was promoted in the regions with microcavities as well as in the samples sintered at high temperature.